Klorin trifluorida

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Klorin trifluorida
Skeletal formula of chlorine trifluoride with some measurements
Spacefill model of chlorine trifluoride
Nama
Nama IUPAC (sistematis)
Trifluoro-λ3-chlorane[1] (substitutive)
Nama lain
Chlorotrifluoride
Penanda
Model 3D (JSmol)
ChEBI
ChemSpider
ECHA InfoCard 100.029.301
Nomor EC 232-230-4
Referensi Gmelin 1439
MeSH chlorine+trifluoride
Nomor RTECS FO2800000
Nomor UN 1749
Sifat
ClF3
Massa molar 92,45 g·mol−1
Penampilan Colorless gas or greenish-yellow liquid
Bau sweet, pungent, irritating, suffocating[2][3]
Densitas 3.779 g/L[4]
Titik lebur −76,34 °C (−105,41 °F; 196,81 K)[4]
Titik didih 11,75 °C (53,15 °F; 284,90 K)[4] (decomposes @ 180 °C (356 °F; 453 K))
Exothermic hydrolysis[5]
Kelarutan Reacts with benzene, toluene, ether, alcohol, acetic acid, selenium tetrafluoride, nitric acid, sulfuric acid, alkali, hexane.[5] Soluble in CCl4 but can be explosive in high concentrations.
Tekanan uap 175 kPa
-26.5·10−6 cm3/mol[6]
Viskositas 91.82 μPa s
Struktur
T-shaped
Termokimia[7]
Kapasitas kalor (C) 63.9 J K−1mol−1
Entropi molar standar (So) 281.6 J K−1mol−1
Entalpi pembentukan standarfHo) −163.2 kJ mol−1
Energi bebas GibbsfG) −123.0 kJ mol−1
Bahaya
Bahaya utama explosive when exposed to organics, reacts violently with water[3]
Lembar data keselamatan natlex.ilo.ch
Piktogram GHS Templat:GHS flame over circle The corrosion pictogram in the Globally Harmonized System of Classification and Labelling of Chemicals (GHS) The skull-and-crossbones pictogram in the Globally Harmonized System of Classification and Labelling of Chemicals (GHS) The health hazard pictogram in the Globally Harmonized System of Classification and Labelling of Chemicals (GHS)
Keterangan bahaya GHS Danger
Titik nyala noncombustible [3]
Dosis atau konsentrasi letal (LD, LC):
95 ppm (rat, 4 hr)
178 ppm (mouse, 1 hr)
230 ppm (monkey, 1 hr)
299 ppm (rat, 1 hr)
[8]
Batas imbas kesehatan AS (NIOSH):
PEL (yang diperbolehkan)
C 0.1 ppm (0.4 mg/m3)[3]
REL (yang direkomendasikan)
C 0.1 ppm (0.4 mg/m3)[3]
IDLH (langsung berbahaya)
20 ppm[3]
Senyawa terkait
Senyawa terkait
Chlorine pentafluoride

Chlorine monofluoride
Bromine trifluoride
Iodine trifluoride

Kecuali dinyatakan lain, data di atas berlaku pada temperatur dan tekanan standar (25 °C [77 °F], 100 kPa).
YaY verifikasi (apa ini YaYN ?)
Sangkalan dan referensi

Klorin trifluorida adalah sebuah senyawa interhalogen dengan rumus kimia ClF3. Senyawa ini berwujud gas tak berwarna, beracun, korosif, dan sangat reaktif. Senyawa ini sering dijual dalam bentuk cair (dengan diberi tekanan tinggi), dan dalam wujud ini ClF3 berwarna kuning kehijauan muda. Senyawa ini banyak digunakan sebagai bahan bakar roket, berbagai proses di industri semikonduktor,[9][10][11] pengolahan bahan bakar nuklir,,[12] serta proses-proses industri lainnya.[13]

Referensi[sunting | sunting sumber]

  1. ^ "Chlorine trifluoride – Compound Summary". PubChem Compound. USA: National Center for Biotechnology Information. 16 September 2004. Identification and Related Records. Diakses tanggal 9 October 2011. 
  2. ^ ClF3/Hydrazine Archived 2007-02-02 di Wayback Machine. at the Encyclopedia Astronautica.
  3. ^ a b c d e f "NIOSH Pocket Guide to Chemical Hazards #0117". National Institute for Occupational Safety and Health (NIOSH). 
  4. ^ a b c Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.58. ISBN 978-1-4398-5511-9. 
  5. ^ a b Chlorine fluoride (ClF3) Archived 2013-10-29 di Wayback Machine. at Guidechem Chemical Network
  6. ^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.132. ISBN 978-1-4398-5511-9. 
  7. ^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 5.8. ISBN 978-1-4398-5511-9. 
  8. ^ "Chlorine trifluoride". Immediately Dangerous to Life and Health. National Institute for Occupational Safety and Health (NIOSH). 
  9. ^ Habuka, Hitoshi; Sukenobu, Takahiro; Koda, Hideyuki; Takeuchi, Takashi; Aihara, Masahiko (2004). "Silicon Etch Rate Using Chlorine Trifluoride". Journal of the Electrochemical Society. 151 (11): G783–G787. doi:10.1149/1.1806391. 
  10. ^ Xi, Ming et al. (1997) Templat:US Patent "Process for chlorine trifluoride chamber cleaning"
  11. ^ Habuka, Hitoshi (2012). "Etching of Silicon Carbide Using Chlorine Trifluoride Gas". Physics and Technology of Silicon Carbide Devices. doi:10.5772/50387. ISBN 978-953-51-0917-4. publikasi akses terbuka - bebas untuk dibuka
  12. ^ Board on Environmental Studies and Toxicology, (BEST) (2006). Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5. Washington D.C.: National Academies Press. hlm. 40. ISBN 978-0-309-10358-9.  (available from National Academies Presspublikasi akses terbuka - bebas untuk dibuka)
  13. ^ Boyce, C. Bradford and Belter, Randolph K. (1998) Templat:US Patent "Method for regenerating halogenated Lewis acid catalysts"